Spatial Profiling of Glow Discharge Plasma by Dual Magnetron Configuration
DOI:
https://doi.org/10.2025/kctg2071Abstract
In this work, the effects of dual magnetron configuration on the spatial distribution of glow discharge plasma employed in sputtering technique are introduced. Three different configurations of magnetrons in a dc sputtering system were tested. Results showed that the configuration choice allows for fine-tuning the plasma column's width and focus, giving engineers unparalleled control over the properties of the resulting thin films, from thickness uniformity to structural quality.
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