Morphological Characteristics of Plasma-Etched Silicon Substrates Coated with Nickel Oxide Nanoparticles for Optoelectronics Applications
Abstract
In this work, the morphological characteristics of the surfaces formed by deposition of nickel oxide nanostructures on silicon surfaces were studied. These structures are commonly used in optoelectronics and nanoelectronics due to their stability and functionality under high light intensity conditions. The morphology of the prepared samples was found to depend on the concentration of NiO nanoparticles deposited on Si substrate surface, which in turn would affect the overall characteristics of the heterojunction structures fabricated from these samples.
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