APL007-1-2 Characteristics of Nickel Ferrite Thin Film Magnetic Sensor Fabricated by Sputtering Technique
Abstract
In this work, a magnetic sensor was fabricated from nickel ferrite thin films prepared by sputtering technique. The nickel and iron targets were co-sputtered and the optimum samples were prepared using Ar:O2 gas mixture of 40:60 mixing ratio, total gas pressure of 0.6 mbar, discharge voltage of 2.1 kV, discharge current of 20 mA and inter-electrode distance of 5 cm. These samples showed high structural purity and the minimum particle size was determined to be 25 nm. The average surface roughness of these samples was 0.465 nm. The sensor devices fabricated from these samples were characterized to determine the optimum preparation conditions and the minimum magnetic field intensity detected by the fabricated sensor was 38.2 G.
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