Effect of Mixing Ratio of Precursors on Structural and Optical Characteristics of Nanostructured Nickel Oxynitride Thin Films
Abstract
In this work, the effect of mixing ratio of the precursors on the structural and optical characteristics of nickel oxynitride thin films has been determined and studied. Thin film samples were prepare using different mixing ratios of Ni(NO3)2):NiCl2 precursors (1:1, 2:1, 3:1, 4:1, 5:1, and 6:1). The x-ray diffraction (XRD) patterns of the prepared samples were recorded and compared. A reasonable change in the crystalline structure was observed as the mixing ratio of the precursors was changed. As well, the surface roughness of the prepared samples were compared. The optical characteristics of the prepared films were compared and found very sensitive to the variation of the mixing ratio of the precursors.
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